Method of fabricating a semiconductor light emitting device with etched end surface

ABSTRACT

A method of fabricating a semiconductor light emitting device includes fabricating semiconductor light emitting devices on a large scale by forming desirable end surfaces of resonators using an etching process. The method includes the steps of forming, on a base body, semiconductor layers for constituting a plurality of semiconductor light emitting devices; grooving the semiconductor layers formed on the base body in the direction from a front surface of the semiconductor layers to the base body, to form stripe-like grooves; and forming a semiconductor film in the grooves by epitaxial growth; wherein a side surface of each of the grooves, which side surface finally forms an end surface of a resonator of each of the semiconductor light emitting devices, is a crystal plane being later in epitaxial growth rate than a bottom surface of the groove.

This application is a Divisional of application Ser. No. 09/026,895 filed Feb. 20, 1998 now U.S. Pat. No. 5,939,734.

BACKGROUND OF THE INVENTION

The present invention relates to a semiconductor light emitting device, for example, a semiconductor laser, and a method of fabricating the same.

In a semiconductor light emitting device such as a semiconductor laser, it is desired that a light emitting at an end surface of an optical resonator is composed of an optical mirror surface. In general, such an end surface of an optical resonator is formed of a cleavage crystal plane. In the case where an end surface of an optical resonator is formed of a cleavage crystal plane, generally, a semiconductor substrate is first prepared in which a plurality of stripe-like resonators each being equivalent to several semiconductor light emitting devices are formed in parallel to each other. Then, the semiconductor substrate is cleaved along planes crossing the lengthwise direction of the stripe-like optical resonators into a plurality of semiconductor bars each having a width corresponding to a length of a resonator of a semiconductor laser chip to be finally obtained, wherein the cleavage surface is taken as the end surface of the resonator of the semiconductor device finally obtained. A protective film or an optical film having a specific reflectance is formed on each side surface of the semiconductor bar, wherein each side surface constitutes an end surface of the resonator. Then, the semiconductor bar is cut along lines between respective stripes to form semiconductor laser chips.

However, the above method has a problem since that the worker must handle a plurality of semiconductor bars after one semiconductor substrate is divided into multiple semiconductor bars; the handling thereof is laborious, resulting in degraded productivity on a large scale.

It is proposed that a method in constructing an end surface of a resonator is formed via an etched surface. This method does not require additional work for forming end surfaces of resonators by the above cleavage; that is, additional work for preparing semiconductor bars. As a result, according to this method, the worker can almost handle a semiconductor substrate equivalent to several semiconductor lasers as it is substantially up to the sizing step for forming semiconductor laser chips, thereby increasing productivity on a larger scale.

In the method using etching a problem occurs in that the etched surface is not necessarily smooth in the obtaining of a semiconductor laser. A so-called “facet degradation” is increased, to thus reduce luminous efficiency and lower service life.

SUMMARY OF THE INVENTION

An object of the present invention is to provide a semiconductor light emitting device such as a semiconductor laser suitable for mass-production, in which a desirable end surface of a resonator of the device is formed using an etching process, and a method of fabricating the semiconductor light emitting device.

To achieve the above object, according to a first aspect of the present invention, there is provided a semiconductor light emitting device, including: semiconductor layers formed on a base body for constructing a plurality of semiconductor light emitting devices, stripe-like grooves formed in the semiconductor layers formed on the base body in the direction from a front surface of the semiconductor layers to the base body and a semiconductor film formed in the grooves by epitaxial growth, wherein a side surface of each of the grooves, forms an end surface of a resonator of each of the semiconductor light emitting devices is a crystal plane being later in expitaxial growth rate than a bottom surface of the groove.

According to a second aspect of the present invention, there is provided a method of fabricating a semiconductor light emitting device including the steps of: forming semiconductor layers on a base body for constructing a plurality of semiconductor light emitting devices, grooving the semiconductor layers formed on the base body in a selected direction from a front surface of the semiconductor layers to the base body to form stripe-like grooves, and forming a semiconductor film in the grooves by epitaxial growth wherein a side surface of each of the grooves forms an end surface of a resonator of each of the semiconductor light emitting devices is a crystal plane having a lower expitaxial growth rate than a bottom surface of the groove.

According to the present invention, surfaces of resonators of semiconductor light emitting devices are formed by grooving a semiconductor substrate having semiconductor layers constituting a plurality of semiconductor light emitting devices. As a result, the method of the present invention makes it possible to simply fabricate a semiconductor light emitting device.

Further, according to the present invention, by epitaxial growth of a semiconductor film in each groove, a flat, smooth surface is formed on a side surface of the groove. The reason for this is as follows: namely, according to the present invention, the side surface of the groove is basically formed of a plane having a lower epitaxial growth rate (hereinafter, such a plane is referred to simply as a specific crystal plane). When a semiconductor film is formed on each side surface of the groove by epitaxial growth, even if the side surface does not become smooth and contains a different crystal plane in addition to the specific crystal plane, the epitaxial growth proceeds for the different crystal plane. Also, if the epitaxial growth involves generation of the specific crystal plane, the epitaxial growth is apparently stopped at the specific crystal plane. As a result, since the end surface of the resonator is formed of only the specific crystal plane, the end surface is formed as a very smooth plane at an atomic level. This makes it possible to reduce the facet degradation, to improve luminous efficiency and stability, and to increase service life.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are schematic sectional views illustrating steps for fabricating a semiconductor light emitting device according to one embodiment of the present invention;

FIG. 2 is a perspective view illustrating additional steps for fabricating the semiconductor light emitting device according to the embodiment of the present invention;

FIG. 3 is a perspective view illustrating additional steps for fabricating the semiconductor light emitting device according to the embodiment of the present invention;

FIG. 4 is a perspective view illustrating a additional steps for fabricating the semiconductor light emitting device according to the embodiment of the present invention;

FIG. 5 is a perspective view illustrating further additional steps for fabricating the semiconductor light emitting device according to the embodiment of the present invention; and

FIG. 6 is a perspective view of a semiconductor light emitting device obtained by the method of fabricating a semiconductor light emitting device of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

Hereinafter, a preferred embodiment will be described with reference to the drawings.

In this embodiment, the present invention is applied to an AlGaAs based semiconductor laser. First, as shown in FIG. 1A, a wafer-shaped semiconductor base body 1 made from GaAs of a first conducting type (for example, n-type) is prepared. Next, a first clad layer 2 made from Al_(x)Ga_(1-x)As of the first conducting type (n-type), an active layer 3 made from Al_(y)Ga_(1-y)As (0≦y<x), a second clad layer 4 made from Al_(x)Ga_(1-x)As of a second conducting type (for example, p-type), and a cap layer 5 made from GaAs of the second conducting type (p-type) are sequentially formed on the semiconductor base body 1 by epitaxial growth using the known MOCVD (Metalorganic Chemical Vapor Deposition) process, thus forming a semiconductor substrate 6. In addition, a buffer layer made from GaAs or the like may be previously formed on the semiconductor base body 1 as needed (not shown).

As shown in FIG. 1B, a plurality of ridge grooves 7 are formed in the semiconductor substrate 6 by etching to form a plurality of ridge portions R arranged parallel to each other. Each of the ridge portions R is positioned between the two adjacent ridge grooves 7, and it has a width equivalent to a width of an optical resonator of a semiconductor laser to be formed. Then, a film of GaAs of the first conducting type (n-type) is formed by epitaxial growth. The ridge grooves 7 are buried with the n-type GaAs film, followed by planarization of the surface of the n-type GaAs film to form current constriction layers 8 in the ridge grooves 7 and also to expose the cap layers 5 at the ridge portions R between the current constriction layers 8.

Then, as shown in FIG. 2, a mask layer 9 is formed on the semiconductor substrate 6. The mask layer 9 is used as a mask for selective epitaxial growth (which will be described later) and can be also used as a mask for grooving performed in a subsequent step. To be more specific, a plurality of stripes of the mask layer 9, each having a specific width, are formed in such a manner as to be parallel to each other at specific intervals and to extend in a crosswise direction across the light emitting regions of the devices to be formed, by forming a SiO₂ layer on the entire surface of the semiconductor substrate 6 by CVD or the like and patterning the SiO₂ layer into stripe shapes using photolithography and etching. The width of the single stripe of the mask layer 9 is selected at a value corresponding to a length of the optical resonator of the semiconductor device finally formed.

As shown in FIG. 3, a stripe-like groove 10 having side surfaces 10 s being substantially upright is formed between the two adjacent stripes of the mask layer 9 by anisotropically dry-etching or crystallographic-etching the semiconductor substrate 6 using the mask layer 9 as an etching mask. Specifically, the anisotropic etching is performed in the direction from the upper side of the epitaxially grown semiconductor layers, that is, from the side of the cap layer 5 to a depth at least lower than that of the active layer 3, for example, to a depth reaching the GaAs semiconductor base body 1. At this time, the extending direction of the stripe-like groove 10 is selected such that the side surface 10 s is mainly formed of, for example, a (011) crystal plane which is lowest in epitaxial growth rate among crystal planes. To be more specific, assuming that the semiconductor base body 1, that is, the semiconductor substrate 6 has a (100) crystal plane, if both the side surfaces 10 s of each groove 10 are intended to be mainly formed of a (011) crystal plane respectively, the direction of the groove 10, that is, the direction of the stripes of the mask layer 9 may be selected at the direction along a [01-1] crystal axis.

As shown in FIG. 4, a semiconductor film 11 made from Al_(z)Ga_(1-z)As (z>x) is formed by selective epitaxial growth using, for example, MOCVD with the mask layer 9 used as an epitaxial growth mask. In this process, since the amount of growth will be relatively large for a bottom surface of the stripe-like groove 10 mainly formed of the (100) crystal plane, the semiconductor film 11 is formed thick on the bottom surface while the side surfaces 10 s of the stripe-like groove 10 are mainly formed of the (011) crystal plane respectively. The semiconductor film 11 scarely grows very little on both side surfaces 10 s. In this case, the side surfaces 10 s, which are the etched surfaces, are not necessarily formed of only the (011) crystal planes; that is, the side surfaces 10 s possibly contain other crystal planes to some extent, in addition to the (011) crystal plane. However, if the side surfaces 10 s contain other crystal planes, the semiconductor film 11 is formed on the other crystal planes by epitaxial growth. Accordingly, if the epitaxial growth involves generation of the (011) crystal plane, the epitaxial growth is almost stopped at the (011) and crystal plane. As a result, the surfaces of the semiconductor film 11 formed on the side surfaces 10 s become smooth surfaces at an atomic level depending on the (011) and crystal plane. After that, while not shown, an optical film having a specific reflectance required for the end surface of the resonator is formed as needed on the semiconductor film 11.

Then, as shown in FIG. 5, the mask layer 9 is removed by etching, and counter electrodes 12 and 13 of the semiconductor laser (which will be formed) are formed on both the top and bottom surfaces of the semiconductor substrate 6 so as to be in ohmic contact therewith. After that, the semiconductor substrate 6 is cut, that is, subjected to sizing, along planes indicated by chain lines x₁, x₂, x₃, . . . , x_(n) extending in the stripe-like grooves 10 and along planes indicated by chain lines y₁, y₂, y₃, . . . , y_(n) extending in the current constriction layers 8 perpendicularly to the chain lines x₁, x₂, x₃, . . . , x_(n).

Thus, as shown in FIG. 6, a desired semiconductor laser, that is, semiconductor light emitting device is obtained, in which an end surface of a resonator, that is, a light emitting surface S is formed from the above smooth semiconductor film 11.

In the above embodiment, the first conducting type is taken as the n-type and the second conducting type is taken as the p-type; however, the first conducting type may be taken as the p-type and the second conducting type may be taken as the n-type. Further, the above embodiment is described using the structure in which the clad layers 2 and 3 are disposed adjacent to the active layer 3; however, the present invention can be applied to semiconductor light emitting devices having various structures, for example, a SCH (Separate Confinement Heterostructure) in which a guide layer is formed adjacent to the active layer 3, and a structure in which the current constriction layer 8 is composed of a high resistance layer doped with an impurity by ion implantation.

Further, while the above embodiment is described by example of fabrication of an AlGaAs based semiconductor light emitting device, the present invention can be applied to fabrication of a group III-V semiconductor light emitting device, a group II-VI semiconductor light emitting device, or the like. 

What is claimed is:
 1. A method of fabricating a semiconductor light emitting device, comprising the steps of: forming, on a base body, semiconductor layers for constituting a plurality of semiconductor light emitting devices; grooving the semiconductor layers formed on the base body in a direction from a front surface of the semiconductor layers to the base body, to form stripe-like grooves, each groove having a side surface and a bottom surface; and forming a semiconductor film in the groove by epitaxial growth, wherein the side surface of each of the grooves forms an end surface of a resonator, and wherein a structure of the semiconductor layers and the step of forming the semiconductor film are controlled in such a way that the side surface of the groove is of a crystal plane that is of a later epitaxial growth than the bottom surface of the groove.
 2. A method of fabricating a semiconductor light emitting device according to claim 1, wherein said step of grooving the semiconductor layers formed on the base body in the direction from a front surface of the semiconductor layers to the base body is carried out using a SiO₂ film as a mask.
 3. A method of fabricating a semiconductor light emitting device according to claim 1, further comprising the step of cleaving the semiconductor light emitting devices along said grooves.
 4. A method of fabricating a semiconductor light emitting device according to claim 1, wherein said epitaxial growth is performed by a metalorganic chemical vapor deposition process. 